Model for photoresist-induced charging damage in ultra-thin gate oxides

Horng-Chih Lin*, Chao-Hsin Chien, Meng Feng Wang, Tiao Yuan Huang, Chun Yen Chang

*此作品的通信作者

研究成果: Paper同行評審

3 引文 斯高帕斯(Scopus)

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Engineering & Materials Science