Mobility enhancement in local strain channel nMOSFETs by stacked a-Si/poly-Si gate and capping nitride

Tsung Yi Lu*, Tien-Sheng Chao

*此作品的通信作者

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18 引文 斯高帕斯(Scopus)

摘要

A local strained channel nMOSFET has been fabricated by a stress control technique utilizing a stacked a-Si/poly-Si gate and a SiN capping layer. It is found that the transconductance (GM) of nMOSFETs increases as the thickness of a-Si is increased. We also found that the GM of devices with the SiN capping layer exhibits a 17% increase compared to that of its counterparts. The stacked gate a-Si/poly-Si with the capping layer can improve the GM further to 29% more than the single-poly-Si gate structure without SiN capping layer.

原文English
頁(從 - 到)267-269
頁數3
期刊IEEE Electron Device Letters
26
發行號4
DOIs
出版狀態Published - 1 4月 2005

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