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Microstructural investigation of epitaxial aluminum films grown by molecular beam epitaxy
Thi Hien Do
*
, Chu Chun Wu
, Yu Hsun Wu
,
Sheng Di Lin
*
此作品的通信作者
電子研究所
研究成果
:
Article
›
同行評審
8
引文 斯高帕斯(Scopus)
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Keyphrases
Molecular Beam Epitaxy
100%
Epitaxial
100%
Al Film
100%
Aluminum Film
100%
Microstructural Investigation
100%
Si Substrate
66%
Sapphire Substrate
66%
GaAs Substrate
66%
Interfacial Bonding
66%
Atomic Force Microscopy
33%
Gallium Arsenide
33%
Chemical Composition
33%
Microstructure
33%
Diffraction
33%
Deposited Film
33%
Sapphire
33%
Atomic Scale
33%
Sharp Interface
33%
Secondary Ion Mass Spectrometry
33%
Smooth Surface
33%
Electron Microscopy Imaging
33%
Epitaxially Grown
33%
Scanning Transmission Electron Microscopy
33%
Hydroxide
33%
Al-Si
33%
Al Thin Film
33%
Al Substrate
33%
Smooth Interface
33%
Al(111)
33%
Atomic Resolution Scanning Transmission Electron Microscopy
33%
Engineering
Si Substrate
100%
Sapphire Substrate
100%
Gaas Substrate
100%
Interfacial Bonding
100%
Aluminum Film
100%
Gallium Arsenide
50%
Thin Films
50%
Ray Diffraction
50%
Deposited Film
50%
Atomic Force Microscopy
50%
Interlayer
50%
Smooth Surface
50%
Material Science
Film
100%
Aluminum
100%
Molecular Beam Epitaxy
100%
Gallium Arsenide
50%
Sapphire
50%
Scanning Transmission Electron Microscopy
33%
Thin Films
16%
Secondary Ion Mass Spectrometry
16%
Phase Composition
16%
Atomic Force Microscopy
16%