Micro knife-edge optical measurement device in a silicon-on-insulator substrate

Keyphrases

• Silicon-on-insulator 100%
• Knife-edge 100%
• Optical Measurement Device 100%
• Insulator Substrate 100%
• Reactive Ion Etching 50%
• On chip 50%
• Laser Beams 50%
• Residual Stress Effect 50%
• Signal Conditioning 50%
• Micro-electro-mechanical Systems Technology 50%
• Knife-edge Method 50%
• Conditioning Circuitry 50%
• Optical Profile 50%
• Photodetector 50%
• Focus Spot 50%
• Buried Oxide 50%
• Profile Measurement 50%
• Deep Reactive Ion Etching 50%
• Beam Spot 50%

Engineering

• Silicon on Insulator 100%
• Residual Stress 50%
• Photodetector 50%
• Signal Conditioning 50%
• Micro-Electro-Mechanical System 50%
• System Technology 50%
• Oxide Layer 50%
• Etching Process 50%
• Deep Reactive Ion Etching 50%
• Laser Beams 50%

Material Science

• Silicon 100%
• Optical Measurement 100%
• Reactive Ion Etching 50%
• Residual Stress 50%
• Oxide Compound 50%
• Microelectromechanical System 50%