Micro-fabrication of hemispherical poly-silicon shells standing on hemispherical cavities

Keyphrases

• Polysilicon 100%
• Hemispherical Cavity 100%
• Microfabrication 100%
• Isotropic Wet Etching 75%
• High Aspect Ratio 50%
• Thick Photoresist 50%
• Mask Design 50%
• Alignment Mark 50%
• Sacrificial Layer 25%
• Photoresist 25%
• Arc Length 25%
• Fabrication Methods 25%
• Etchant 25%
• Ultrasonic Vibration 25%
• Wet Etching 25%
• Etching Process 25%
• Surface Micromachining 25%
• Hydrofluoric Acid 25%
• Wet Etch Process 25%
• Two-step Etching 25%
• Microfabrication Techniques 25%
• Layer Materials 25%
• Silicon Cavity 25%
• AZ4620 25%
• Bulk Micromachining 25%
• Surface Well 25%
• Optimal Concentration 25%
• Circle-like 25%

Engineering

• Photoresist 100%
• Microfabrication 100%
• High Aspect Ratio 66%
• Etching Process 66%
• Thin Layer 33%
• Surface Micro-Machining 33%
• Ultrasonics 33%
• Bottom Surface 33%
• Material Layer 33%
• Arc Length 33%
• Polysilicon 33%

Material Science

• Silicon 100%
• Wet Etching 100%
• Microfabrication 100%
• Surface (Surface Science) 75%
• Micromachining 25%