MapReduce-based pattern classification for design space analysis

Yan Shiun Wu, Hong Yan Su, Yi Hsiang Chang, Rasit Onur Topaloglu, Yih-Lang Li

研究成果: Conference contribution同行評審

3 引文 斯高帕斯(Scopus)

摘要

With the ongoing reduction of feature size, design for manufacturability is a critical concern in advanced technology nodes. Pattern classification is a promising and widely employed approach for design space analysis, design rule generation, and yield optimization. In this paper, we propose a hybrid algorithm that account for two variations for classification metrics: feature edge displacement and total feature area difference. A MapRe-duce-based framework is proposed to reduce the complexity of the pattern classification problem such that orders of magnitude of performance improvement can be realized. Our experimental results indicate that regarding accuracy and runtime, this work out-performs the winner of the CAD Contest at ICCAD 2016 in terms of contest scoring measure.

原文English
主出版物標題2018 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2018
發行者Institute of Electrical and Electronics Engineers Inc.
頁面1-4
頁數4
ISBN(電子)9781538642603
DOIs
出版狀態Published - 5 6月 2018
事件2018 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2018 - Hsinchu, 台灣
持續時間: 16 4月 201819 4月 2018

出版系列

名字2018 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2018

Conference

Conference2018 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2018
國家/地區台灣
城市Hsinchu
期間16/04/1819/04/18

指紋

深入研究「MapReduce-based pattern classification for design space analysis」主題。共同形成了獨特的指紋。

引用此