Low energy ion beam assisted deposition of TiN thin films on silicon

Keyphrases

• TiN Thin Films 100%
• Resistivity 100%
• Low-energy Ion Beam 100%
• Ion Energy 100%
• Ion Beam Assisted Deposition 100%
• Microstructure 50%
• Si (100) Substrate 50%
• Deposition Methods 50%
• Deposition Temperature 50%
• Preferred Orientation 50%
• Ion-induced Defects 50%
• Ion Deposition 50%
• Process Parameters Influence 50%
• Incident Angle 50%

Engineering

• Thin Films 100%
• Ion Energy 100%
• Assisted Deposition 100%
• Deposition Method 50%
• Deposition Temperature 50%
• Major Factor 50%
• Preferred Orientation 50%
• Process Parameter 50%
• Incident Angle 50%
• Induced Defect 50%

Material Science

• Thin Films 100%
• Electrical Resistivity 100%
• Silicon 100%
• Ion Beam Assisted Deposition 100%
• Film 50%