Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications

H. L. Chen*, Y. F. Chuang, C. C. Lee, C. I. Hsieh, Fu-Hsiang Ko, L. A. Wang

*此作品的通信作者

研究成果: Conference article同行評審

指紋

深入研究「Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications」主題。共同形成了獨特的指紋。

Earth and Planetary Sciences

Keyphrases

Material Science