Local Strained Channel (LSC) nMOSFETs by different poly-Si gate and SiN capping layer thicknesses: Mobility enhancement, size dependence, and hot carrier stress
Yao Jen Lee*, Chia Hao Fan, Wen Luh Yang, Wen Yan Lin, Bohr Ran Huang, Tien-Sheng Chao, D. S. Chuu
*此作品的通信作者
研究成果: Conference contribution › 同行評審