Lithography-aware 1-dimensional cell generation

Po Hsun Wu, Po-Hung Lin, Tung Chieh Chen, Tsung Yi Ho, Yu Chuan Chen

研究成果: Conference contribution同行評審

摘要

As the process technology advances to the sub-wavelength era, the 1-dimensional (1-D) design style is regarded as one of the most effective ways to continue scaling down the minimum feature size. This paper presents the lithography-aware cell generation algorithms which simultaneously minimize 1-D cell area and enhance the printability. Experimental results show that the proposed algorithms can effectively and efficiently reduce the number of diffusion gaps, and minimize used routing tracks. Consequently, our approach results in smaller 1-D cell area and better printability.

原文English
主出版物標題2013 European Conference on Circuit Theory and Design, ECCTD 2013 - Proceedings
DOIs
出版狀態Published - 1 十二月 2013
事件2013 European Conference on Circuit Theory and Design, ECCTD 2013 - Dresden, Germany
持續時間: 8 九月 201312 九月 2013

出版系列

名字2013 European Conference on Circuit Theory and Design, ECCTD 2013 - Proceedings

Conference

Conference2013 European Conference on Circuit Theory and Design, ECCTD 2013
國家/地區Germany
城市Dresden
期間8/09/1312/09/13

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