Laser direct imaging of transparent indium tin oxide electrodes using high speed stitching techniques

Pi-Ying Cheng, Wen Tse Hsiao, Chien Kai Chung, Shih Feng Tseng*, Ien Chang Liao

*此作品的通信作者

    研究成果: Article同行評審

    2 引文 斯高帕斯(Scopus)

    摘要

    To accomplish an electrode patterning in large area, we present a high speed stitching technique used in an ultraviolet laser processing system and investigate the interaction between laser beams and indium tin oxide (ITO) thin films deposited on glass substrates. After optimizing the process parameters of the laser direct imaging (LDI) for the large-area electrode patterning, the ablated lines looked like regularly fish-scale marks of about a 40 μm diameter and a 120 nm depth around the processing path. The parameters includes the laser power of 1W, the scanning speed of galvanometers of 800 mm/s, and the laser pulse repetition frequency of 50 kHz. Moreover, the resistance value of the ablated ITO thin film is larger than 200MΩ that is electrically insulated from the other regions of electrode structure. LDI technology with UV laser beam has great potential applications in patterning on wafer or sapphire substrates and patterning a conductive layer deposited on the touch panels for semiconductor and optoelectric industries, respectively.

    原文English
    頁(從 - 到)732-735
    頁數4
    期刊Optical Review
    21
    發行號5
    DOIs
    出版狀態Published - 3 十月 2014

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