Large area MoS 2 van der Waals epitaxy on III-Ns and the epitaxial formation of a n-MoS 2 /p-InGaN diode

Kyooho Jung, Che Yu Liu, J. D. Kim, Wonsik Choi, Weidong Zhou, Hao-Chung Kuo, Xiuling Li

研究成果: Conference contribution同行評審

5 引文 斯高帕斯(Scopus)

摘要

Epitaxial growth of aligned MoS 2 triangles on GaN substrates and their evolution into a continuous sheet of >centimeter size are demonstrated. An n-MoS 2 /p-InGaN diode with clear rectifying behavior is realized by direct van der Waals epitaxy.

原文English
主出版物標題2016 IEEE Photonics Conference, IPC 2016
發行者Institute of Electrical and Electronics Engineers Inc.
頁面657-658
頁數2
ISBN(電子)9781509019069
DOIs
出版狀態Published - 10月 2016
事件29th IEEE Photonics Conference, IPC 2016 - Waikoloa, 美國
持續時間: 2 10月 20166 10月 2016

出版系列

名字2016 IEEE Photonics Conference, IPC 2016

Conference

Conference29th IEEE Photonics Conference, IPC 2016
國家/地區美國
城市Waikoloa
期間2/10/166/10/16

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