Investigation of NH3Plasma Nitridation on Hysteresis-Free Gate-All-Around Stacked Poly-Si Nanosheet Channel FeFETs

Dong Ru Hsieh, Chia Chin Lee, Zi Yang Hong, Tien Sheng Chao*

*此作品的通信作者

研究成果: Conference contribution同行評審

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Engineering & Materials Science

Chemical Compounds