Keyphrases
HfO2
100%
HfO2 Films
100%
Deposition Methods
100%
Thickness Effect
100%
Conductive Bridging Random Access Memory (CBRAM)
100%
Deposit Thickness
100%
Technique Effect
100%
Electrochemical Metallization Memory
50%
Surface Composition Analysis
25%
Low Power
25%
Integrated Circuits
25%
Electrical Performance
25%
Electrical Properties
25%
Three-dimensional (3D)
25%
Deposition Process
25%
Circuit Architecture
25%
Retention Time
25%
Atomic Layer Deposition
25%
Integrated Circuit Technology
25%
Bilayer Structure
25%
Amorphous Semiconductors
25%
High Endurance
25%
Switching Layer
25%
Endurance Cycle
25%
Resistive State
25%
Compliance Current
25%
State Distribution
25%
Low Compliance
25%
Memristor
25%
Switching Structure
25%
Chemical Composition Analysis
25%
Memory-in-pixel
25%
Engineering
Conductive
100%
Metallizations
100%
Deposition Process
100%
Random Access Memory
100%
Integrated Circuit
100%
Electrical Performance
50%
Atomic Layer Deposition
50%
Retention Time
50%
Material Science
Film
100%
Electronic Circuit
100%
Chemical Composition Analysis
50%
Surface (Surface Science)
50%
Amorphous Semiconductor
50%