摘要
This paper investigates and compares the impacts of metal-gate work-function variation on important analog figures-of-merit (FOMs) for TFET and FinFET devices using 3-D atomistic TCAD simulations. Our study indicates that, at 0.6 V supply voltage and 0.2 V gate-voltage overdrive, TFET exhibits superior variation immunity regarding transconductance to drain-current ratio (gm/IDS), output resistance (Rout) and intrinsic gain, and comparable variability in gm and cutoff frequency (fT) as compared with the FinFET counterparts. In addition, how the correlations between pertinent parameters (e.g.; gm and Rout) impact the variation immunity of important analog FOMs are analyzed. Our study may provide insights for low-voltage analog design using TFET/FinFET technologies.
原文 | English |
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頁(從 - 到) | 332-336 |
頁數 | 5 |
期刊 | Microelectronics Reliability |
卷 | 55 |
發行號 | 2 |
DOIs | |
出版狀態 | Published - 1 2月 2015 |