Investigation and comparison of analog figures-of-merit for TFET and FinFET considering work-function variation

Ko Chun Lee, Ming Long Fan, Pin Su*

*此作品的通信作者

    研究成果: Article同行評審

    5 引文 斯高帕斯(Scopus)

    摘要

    This paper investigates and compares the impacts of metal-gate work-function variation on important analog figures-of-merit (FOMs) for TFET and FinFET devices using 3-D atomistic TCAD simulations. Our study indicates that, at 0.6 V supply voltage and 0.2 V gate-voltage overdrive, TFET exhibits superior variation immunity regarding transconductance to drain-current ratio (gm/IDS), output resistance (Rout) and intrinsic gain, and comparable variability in gm and cutoff frequency (fT) as compared with the FinFET counterparts. In addition, how the correlations between pertinent parameters (e.g.; gm and Rout) impact the variation immunity of important analog FOMs are analyzed. Our study may provide insights for low-voltage analog design using TFET/FinFET technologies.

    原文English
    頁(從 - 到)332-336
    頁數5
    期刊Microelectronics Reliability
    55
    發行號2
    DOIs
    出版狀態Published - 1 2月 2015

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