TY - JOUR
T1 - Interaction of HCN/DCN with Si(100)-2×1
AU - Bu, Y.
AU - Ma, L.
AU - Lin, Ming-Chang
PY - 1993/12/1
Y1 - 1993/12/1
N2 - We have investigated the spectroscopy and reaction of HCN (DCN) adsorbed on Si(100)-2×1 at Ts ≥ 100 K using HREELS, XPS, and UPS. HCN (DCN) formed dimers and/or polymers on the surface at 100 K and higher dosages (D > 4 langmuirs). The HREEL spectrum obtained after warming a 4.5-langmuir HCN dosed surface to 220 K resembles that obtained with a lower HCN dosage (D < 0.6 langmuir). Two major species, HCNH and CN, could be identified from this spectrum. The former species showed peaks at 160, 368, and ∼400 meV for HC=NH, CH, and NH stretching vibrations, respectively, while the latter showed a peak at 263 meV due to the C≡N stretching vibration. In the corresponding DCN experiment, the DC=ND stretching mode was observed at 124 meV. Annealing the sample at 560 K appeared to cause the reorientation of the CN radical from an end-on to a side-on adsorption geometry as evidenced by HREELS, UPS, and XPS analyses. At 600-800 K, the breaking of NH and CN bonds occurred on the surface. Above 1000 K, a mixture of silicon carbide and silicon nitride was formed after the complete dissociation of CH, NH, and CN bonds and the desorption of H species.
AB - We have investigated the spectroscopy and reaction of HCN (DCN) adsorbed on Si(100)-2×1 at Ts ≥ 100 K using HREELS, XPS, and UPS. HCN (DCN) formed dimers and/or polymers on the surface at 100 K and higher dosages (D > 4 langmuirs). The HREEL spectrum obtained after warming a 4.5-langmuir HCN dosed surface to 220 K resembles that obtained with a lower HCN dosage (D < 0.6 langmuir). Two major species, HCNH and CN, could be identified from this spectrum. The former species showed peaks at 160, 368, and ∼400 meV for HC=NH, CH, and NH stretching vibrations, respectively, while the latter showed a peak at 263 meV due to the C≡N stretching vibration. In the corresponding DCN experiment, the DC=ND stretching mode was observed at 124 meV. Annealing the sample at 560 K appeared to cause the reorientation of the CN radical from an end-on to a side-on adsorption geometry as evidenced by HREELS, UPS, and XPS analyses. At 600-800 K, the breaking of NH and CN bonds occurred on the surface. Above 1000 K, a mixture of silicon carbide and silicon nitride was formed after the complete dissociation of CH, NH, and CN bonds and the desorption of H species.
UR - http://www.scopus.com/inward/record.url?scp=0000938323&partnerID=8YFLogxK
U2 - doi.org/10.1021/j100129a026
DO - doi.org/10.1021/j100129a026
M3 - Article
AN - SCOPUS:0000938323
SN - 0022-3654
VL - 97
SP - 7081
EP - 7087
JO - Journal of physical chemistry
JF - Journal of physical chemistry
IS - 27
ER -