Interaction of HCN (DCN) with Si(111)-7X7 studied with HREELS, UPS, and XPS

Y. Bu, L. Ma, Ming-Chang Lin*

*此作品的通信作者

研究成果: Article同行評審

25 引文 斯高帕斯(Scopus)

摘要

The interaction of HCN (DCN) with Si(111)-7X7 was studied with high-resolution electron energy loss spectroscopy (HREELS), ultraviolet photoelectron spectroscopy (UPS), and X-ray photoelectron spectroscopy (XPS). HCN (DCN) formed dimers and/or polymers on the surface at 100 K with higher dosages (D > 4 langmuirs). Above 200 K, CN radicals in an end-on adsorption geometry were identified as the major species which survived up to 600 K on the surface. This observation was different from that with HCN (DCN) on Si(100)-2X1, where the relative concentration of the HCNH species was higher. The observed difference in the behavior of HCN (DCN) on Si(111)-7X7 and Si(100)-2X1 could be ascribed to the different topologies of the two surfaces.

原文English
頁(從 - 到)11797-11801
頁數5
期刊Journal of physical chemistry
97
發行號45
DOIs
出版狀態Published - 1993

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