Intelligent reticle modification enabled large-area metalens patterning

Chun Yen Chou*, Hsueh Li Liu, Lin Chia Huang, Wilson Guo, Pei-Chen Yu, You Chia Chang, Yao-Wei Huang, Jia Min Shieh

*此作品的通信作者

研究成果: Conference contribution同行評審

摘要

Dielectric metalenses realized by economic photolithography technology are vital to their mass deployment in optoelectronic applications. However, pattern fidelity has become a serious issue that degrades the device performance due to optical proximity effects. Here, we demonstrate an intelligent reticle modification system which modifies the sizes and shapes of designed patterns based on a neural-network U-net lithographic model to produce nanostructures with desired dimensions. We demonstrate 2mm-diameter visible metalenses with diffraction-limited focusing using DUV KrF 248 nm photolithography. This work bridges between the semiconductor process and lens-making industries to realize high-volume manufacturing of versatile metalens and metasurface products.

原文English
主出版物標題Nanoengineering
主出版物子標題Fabrication, Properties, Optics, Thin Films, and Devices XX
編輯Balaji Panchapakesan, Andre-Jean Attias, Andre-Jean Attias, Wounjhang Park
發行者SPIE
ISBN(電子)9781510665200
DOIs
出版狀態Published - 2023
事件Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XX 2023 - San Diego, United States
持續時間: 20 8月 202321 8月 2023

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
12653
ISSN(列印)0277-786X
ISSN(電子)1996-756X

Conference

ConferenceNanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XX 2023
國家/地區United States
城市San Diego
期間20/08/2321/08/23

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