Integration of high-k gate stack systems into planar CMOS process flows

H. R. Huff, A. Agarwal, Y. Kim, L. Perrymore, D. Riley, J. Barnett, C. Sparks, M. Freiler, G. Gebara, B. Bowers, P. J. Chen, P. Lysaght, B. Nguyen, J. E. Lim, S. Lim, G. Bersuker, P. Zeitzoff, G. A. Brown, C. Young, B. ForanF. Shaapur, Tuo-Hung Hou, C. Lim, H. Alshareef, S. Borthakur, D. J. Derro, R. Bergmann, L. A. Larson, M. I. Gardner, J. Gutt, R. W. Murto, K. Torres, M. D. Jackson

研究成果: Conference contribution同行評審

19 引文 斯高帕斯(Scopus)

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