Integration Design and Process of 3-D Heterogeneous 6T SRAM with Double Layer Transferred Ge/2Si CFET and IGZO Pass Gates for 42% Reduced Cell Size

X. R. Yu*, M. H. Chuang, S. W. Chang, W. H. Chang, T. C. Hong, C. H. Chiang, W. H. Lu, C. Y. Yang, W. J. Chen, J. H. Lin, P. H. Wu, T. C. Sun, S. Kola, Y. S. Yang, Yun Da, P. J. Sung, C. T. Wu, T. C. Cho, G. L. Luo, K. H. KaoM. H. Chiang, W. C.Y. Ma, C. J. Su, T. S. Chao, T. Maeda, S. Samukawa, Y. Li, Y. J. Lee, W. F. Wu, J. H. Tarng, Y. H. Wang

*此作品的通信作者

研究成果: Conference contribution同行評審

9 引文 斯高帕斯(Scopus)

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Keyphrases

Engineering

Material Science