摘要
Thin SiN layers and nitride-based multiquantum well (MQW) light emitting diode (LED) structures with conventional single GaN buffer and GaN/SiN double buffers were grown on sapphire substrates by metalorganic chemical vapor deposition (MOCVD). It was found that there exist many nanometer-sized holes on the surface of SiN buffer layers, and such porous SiN layers probably could enhance the lateral growth. Furthermore, it was found that we could use the GaN/SiN double buffer to achieve more reliable nitride-based LEDs.
原文 | English |
---|---|
頁(從 - 到) | 214-217 |
頁數 | 4 |
期刊 | Materials Science and Engineering B: Solid-State Materials for Advanced Technology |
卷 | 111 |
發行號 | 2-3 |
DOIs | |
出版狀態 | Published - 25 8月 2004 |