摘要
Epitaxial layers of AlAs1-xSbx have been prepared by metalorganic vapor phase deposition (MOCVD) in a horizontal, atmospheric-pressure quartz reactor. The influences of the V/lII ratio and the input partial pressure of trimethylantimony were systematically studied. The experimental results are in good agreement with the calculated ones, based on thermodynamic considerations, which implies that the growth of AlAsSb in MOCVD is controlled predominantly by thermodynamics.
原文 | English |
---|---|
頁(從 - 到) | 1370-1373 |
頁數 | 4 |
期刊 | Japanese journal of applied physics |
卷 | 33 |
發行號 | 10A |
DOIs | |
出版狀態 | Published - 10月 1994 |