Influence of ph and h2o2 dosage on the decomposition of carbofuran during the photo-fenton process

Li An Lu, Ying Shih Ma, Mathava Kumar, Jih-Gaw Lin*

*此作品的通信作者

研究成果: Article同行評審

9 引文 斯高帕斯(Scopus)

摘要

The effects of hydrogen peroxide dosage and pH on the decompostion of aqueous carbofuran (50 mg L-1) during the photo-Fenton process, i.e. a combnination of UV irradiation with H2O2/Fe3+, were evaluated. The efficiency of carbon removal by the photo-Fenton process was estimated based on the reductions in dissolved organic carbon (DOC) and carbofuran concentrations. More than 90% carbofuran removal and 33% DOC reduction were observed within 100 min of the photo-Fenton reaction at pH 3, H2O2 dosage of 0.25 mg L-1 min-1 and Fe3+ addition of 35 mg L-1. The photo-Fenton reaction was speeded-up at 4 mg L-1 min-1 of H2O2 dosage, beyond which a decrease in the carbofuran domposition efficiency was observed. At 4 mg L-1 min-1 of H2O2 dosage, 100 and 94% of carbofuran removal and DOC reduction, respectively, were observed within 120 min of the photon-Fenton reaction. Overall, a rapid decomposition as well as mineralization of carbofuran could be achieved at 4 mg L-1 min-1 of H2O2 dosage and pH 3.

原文English
頁(從 - 到)293-297
頁數5
期刊Sustainable Environment Research
20
發行號5
出版狀態Published - 9月 2010

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