Improving spin-coating process using altered cover design

Chao Min Cheng; Ren-Haw Chen

doi:10.1143/JJAP.43.8028

Improving spin-coating process using altered cover design

Chao Min Cheng^*, Ren-Haw Chen

^*此作品的通信作者

機械工程學系

研究成果: Article › 同行評審

1 引文斯高帕斯（Scopus）

摘要

A novel work chamber cover design for a spin coater that can reduce the effect of airflow on spin coating is presented. The experimental results reveal that superior uniformity and film area can be obtained by utilizing the modified design instead of the conventional design.

原文	English
頁（從 - 到）	8028-8029
頁數	2
期刊	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
卷	43
發行號	12
DOIs	https://doi.org/10.1143/JJAP.43.8028
出版狀態	Published - 12月 2004

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10.1143/JJAP.43.8028

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title = "Improving spin-coating process using altered cover design",

abstract = "A novel work chamber cover design for a spin coater that can reduce the effect of airflow on spin coating is presented. The experimental results reveal that superior uniformity and film area can be obtained by utilizing the modified design instead of the conventional design.",

keywords = "Spin coating, Thick-film photoresist, Work chamber cover",

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KW - Thick-film photoresist

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M3 - Article

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JO - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

IS - 12

ER -

Improving spin-coating process using altered cover design

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