Improving Interface State Density of TiN/HfO2/IL Gate Stack on Si0.5Ge0.5 by Optimization of Post Metallization Annealing and Oxygen Pressure

Meng Chien Lee*, Wei Li Lee, Cheng Yu Yu, Hung Ju Lin, Hsien Ho Liu, Jun Lin Zhang, Shin Yuan Wang, Chen-Han Chou, Guang Li Luo, Chao-Hsin Chien

*此作品的通信作者

研究成果: Conference contribution同行評審

1 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Chemical Compounds