Improvement of ultra-thin 3.3 nm thick oxide for Co-salicide process using NF 3 annealed poly-gate

Tzu Yun Chang*, Tan Fu Lei, Tien-Sheng Chao, Cheng Tung Huang, Shi Kuan Chen, Andy Tuan, Steve Chou

*此作品的通信作者

研究成果: Article › 同行評審

指紋

深入研究「Improvement of ultra-thin 3.3 nm thick oxide for Co-salicide process using NF 3 annealed poly-gate」主題。共同形成了獨特的指紋。

Engineering & Materials Science

Physics & Astronomy