Improvement of reliability of metal-oxide semiconductor field-effect transistors with N2O nitrided gate oxide and N2O polysilicon gate reoxidation

Chao Sung Lai*, Tien-Sheng Chao, Tan Fu Lei, Chung Len Lee, Tiao Yuan Huang, Chun Yen Chang

*此作品的通信作者

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Engineering & Materials Science

Physics & Astronomy