Improvement of low dielectric constant methylsilsesquioxane by boron implantation treatment

T. C. Chang, Y. S. Mor, Po-Tsun Liu, T. M. Tsai, C. W. Chen, S. M. Sze, Y. J. Mei

研究成果: Article同行評審

9 引文 斯高帕斯(Scopus)

指紋

深入研究「Improvement of low dielectric constant methylsilsesquioxane by boron implantation treatment」主題。共同形成了獨特的指紋。

Engineering & Materials Science

Chemical Compounds

Physics & Astronomy