Improvement of AlGaN/GaN HEMTs Linearity Using Etched-Fin Gate Structure for Ka Band Applications

研究成果: Article同行評審

5 引文 斯高帕斯(Scopus)

指紋

深入研究「Improvement of AlGaN/GaN HEMTs Linearity Using Etched-Fin Gate Structure for Ka Band Applications」主題。共同形成了獨特的指紋。

Keyphrases

Engineering

Material Science

Physics