Improvement of AlGaN/GaN HEMTs Linearity Using Etched-Fin Gate Structure for Ka Band Applications

Ming Wen Lee, Yueh Chin Lin, Heng Tung Hsu, Francisco Gamiz, Edward Yi Chang*

*此作品的通信作者

研究成果: Article同行評審

4 引文 斯高帕斯(Scopus)

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Keyphrases

Engineering

Material Science

Physics