摘要
The InGaN/sapphire-based photovoltaic (PV) cells with Al 0.14Ga0.86N/In0.21Ga0.79N superlattice structures that serve as absorption layers were grown on patterned sapphire substrates (PSSs). Under global air-mass 1.5 conditions, the shortcircuit current density, the open-circuit voltage, and the fill factor obtained from the PV cells were 1.21 mA/cm2, 2.18 V, and 0.65, respectively, corresponding to a conversion efficiency of 1.71%. Compared with PV devices grown on flat sapphire substrates, the photocurrent of PSS-grown PV devices was enhanced by 26%. The improved PV performance was attributable to the positive effects of the PSS on the material quality.
原文 | English |
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文章編號 | 5719623 |
頁(從 - 到) | 536-538 |
頁數 | 3 |
期刊 | Ieee Electron Device Letters |
卷 | 32 |
發行號 | 4 |
DOIs | |
出版狀態 | Published - 4月 2011 |