Improved plasma charging immunity in ultra-thin gate oxide with fluorine and nitrogen implantation

C. C. Chen*, Horng-Chih Lin, C. Y. Chang, C. C. Huang, Chao-Hsin Chien, T. H. Huang, M. S. Liang

*此作品的通信作者

研究成果: Paper同行評審

1 引文 斯高帕斯(Scopus)

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Engineering & Materials Science