Improved performance of NDLC poly-Si nanowire TFTs by using Ni-gettering

Bau Ming Wang*, Tzu Ming Yang, Yew-Chuhg Wu, Chun Jung Su, Horng-Chih Lin

*此作品的通信作者

研究成果: Conference contribution同行評審

摘要

Nickel contamination inside nickel-metal induced lateral crystallization polycrystalline silicon is an issue to fabricate high performance nanowire thin film transistors. The phosphorous-doped α-Si/chem-SiO2 films were employed as Ni-gettering layers to investigate effect of Ni residues on the performance of NILC poly-Si NW TFTs. It was found that the performance of NW TFTs was greatly improved after Ni-gettering process.

原文English
主出版物標題Thin Film Transistors 10, TFT 10
頁面169-172
頁數4
版本5
DOIs
出版狀態Published - 1 12月 2010
事件10th Symposium on Thin Film Transistor Technologies, TFT 10 - 218th ECS Meeting - Las Vegas, NV, United States
持續時間: 11 10月 201015 10月 2010

出版系列

名字ECS Transactions
號碼5
33
ISSN(列印)1938-5862
ISSN(電子)1938-6737

Conference

Conference10th Symposium on Thin Film Transistor Technologies, TFT 10 - 218th ECS Meeting
國家/地區United States
城市Las Vegas, NV
期間11/10/1015/10/10

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