Improved Electrical Characteristics of Ge p-MOSFET with Ti-GeOx Interfacial Layer by in-situ Plasma-enhanced Atomic Layer Deposition

Hui Hsuan Li, Yu Hsien Lin*, Tsung Yen Tu, Chao Hsin Chien*

*此作品的通信作者

研究成果: Conference contribution › 同行評審

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Keyphrases

Engineering

Material Science

Chemical Engineering