Impacts of work function variation and line edge roughness on hybrid TFET-MOSFET monolithic 3D SRAMs

Jian Hao Wang, Pin Su, Ching Te Chuang

    研究成果: Conference contribution同行評審

    1 引文 斯高帕斯(Scopus)

    摘要

    We analyze the variability of 7T hybrid TFET-MOSFET SRAM and 8T MOSFET SRAM in monolithic 3D technology operating at ultra-low voltage. The impacts of work function variation (WFV) and line edge roughness (LER) on SRAM cell stability, leakage power and performance are investigated and compared using 3D atomistic TCAD mixed-mode Monte-Carlo simulations. The results indicate that WFV and LER have different impacts on read disturb and Vwrite,0, which dominate SRAM stability and is determined by the distinct current drive of TFET and MOSFET. The performance is influenced by the different variations of gate capacitance (Cg) under WFV and LER.

    原文English
    主出版物標題2017 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2017
    發行者Institute of Electrical and Electronics Engineers Inc.
    ISBN(電子)9781509058051
    DOIs
    出版狀態Published - 7 6月 2017
    事件2017 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2017 - Hsinchu, 台灣
    持續時間: 24 4月 201727 4月 2017

    出版系列

    名字2017 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2017

    Conference

    Conference2017 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2017
    國家/地區台灣
    城市Hsinchu
    期間24/04/1727/04/17

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