Impacts of surface nitridation on crystalline ferroelectric phase of Hf_1-xZr_xO₂ and ferroelectric FET performance

Keyphrases

• Surface Nitridation 100%
• Ferroelectric Phase 100%
• Hf0.5Zr0.5O2 100%
• Ferroelectric Field-effect Transistor (FeFET) 100%
• In Situ 33%
• Orthorhombic Phase 33%
• Phase Formation 33%
• NH3 Treatment 33%
• High-resolution 16%
• Reliability Performance 16%
• Leakage Current 16%
• Oxygen Vacancy 16%
• Memory Window 16%
• Transfer Characteristics 16%
• NH3 Plasma Treatment 16%
• Treatment Scheme 16%
• Unstable Behavior 16%
• Interfacial Diffusion 16%
• Tin Electrodes 16%
• Cyclic Operation 16%
• HAXPES 16%
• Non-disruptive 16%
• Ferroelectric Performance 16%

Engineering

• Phase Formation 100%
• Field Effect Transistor 50%
• Ray Photoelectron Spectroscopy 50%
• High Resolution 50%
• Plasma Treatment 50%
• Oxygen Vacancy 50%
• Interfacial Diffusion 50%

Material Science

• Ferroelectric Material 100%
• Nitriding 100%
• Surface (Surface Science) 100%
• Field Effect Transistor 16%
• Oxygen Vacancy 16%
• Photoemission Spectroscopy 16%