Impacts of N 2 and NH 3 plasma surface treatments on high-performance LTPS-TFT with high-κ gate dielectric

Ming Wen Ma*, Tien-Sheng Chao, Tsung Yu Chiang, Woei Cherng Wu, Tan Fu Lei

*此作品的通信作者

研究成果: Article同行評審

11 引文 斯高帕斯(Scopus)

指紋

深入研究「Impacts of N 2 and NH 3 plasma surface treatments on high-performance LTPS-TFT with high-κ gate dielectric」主題。共同形成了獨特的指紋。

Engineering & Materials Science

Chemical Compounds