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Impact of Stripe Shape on the Reflectivity of Monolithic High Contrast Gratings
Magdalena Marciniak
, Tsung Scheng Chang
,
Tien Chang Lu
, Filip Hjort
, Åsa Haglund
, Łucja Marona
, Matusz Gramala
, Paweł Modrzyński
, Robert Kudrawiec
, Krzysztof Sawicki
, Rafał Bożek
, Wojciech Pacuski
, Jan Suffczyński
, Marcin Gȩbski
, Artur Broda
, Jan Muszalski
, James A. Lott
, Tomasz Czyszanowski
*
*
此作品的通信作者
光電工程學系
研究成果
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同行評審
6
引文 斯高帕斯(Scopus)
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深入研究「Impact of Stripe Shape on the Reflectivity of Monolithic High Contrast Gratings」主題。共同形成了獨特的指紋。
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重量
按字母排序
Engineering
Reflectance
100%
Cross Section
83%
Optical Power
83%
Section Shape
50%
Side Wall
33%
Dielectrics
16%
Nanometre
16%
High Quality Factor
16%
Numerical Study
16%
Bragg Cell
16%
One Dimensional
16%
Grating Period
16%
Etching Process
16%
Optoelectronics
16%
Photonic Devices
16%
Monolithic Integration
16%
Arbitrary Cross
16%
Geometrical Parameter
16%
Spectral Bandwidth
16%
Experimental Characterization
16%
Semiconducting Material
16%
Keyphrases
Reflectivity
100%
Monolithic High Contrast Grating
100%
Power Reflection
38%
Etching Process
30%
Optical Power
30%
Grating Stripe
30%
Cross-sectional Shape
23%
Sidewall
15%
Corrugation
15%
Dielectric Materials
7%
High Quality Factor
7%
Semiconductor Materials
7%
Subwavelength Grating
7%
Distributed Bragg Reflector
7%
Grating Mirror
7%
Photonic Devices
7%
Nanometer Scale
7%
Subwavelength
7%
One-dimensional Grating
7%
Optical Microcavity
7%
Shaping Method
7%
Phase Tuning
7%
Precision Control
7%
Geometrical Parameters
7%
Grating Period
7%
Monolithically Integrated
7%
Monolithic Integration
7%
High Optical Power
7%
Trapezoidal Cross-section
7%
Spectral Bandwidth
7%
Experimental Characterization
7%
Polarization Selectivity
7%
Surface Etching
7%
Arbitrary Cross-section
7%
Optical Nanocavities
7%
Physics
Reflectance
100%
Optical Power
83%
Q Factor
16%
Bragg Reflector
16%
Selectivity
16%
Optoelectronics
16%
Optical Device
16%
Semiconductor (Material)
16%
Dielectric Material
16%
Material Science
Reflectivity
100%
Optical Power
100%
Semiconductor Material
20%
Optical Device
20%
Surface Etching
20%
Surface (Surface Science)
20%
Dielectric Material
20%