摘要
This paper investigates the impact of quantum capacitance on the intrinsic inversion-capacitance (Cinv) characteristics of high-mobility multigate III-V-on-insulator nMOSFETs through a numerical simulation corroborated by the theoretical calculation. Nonmonotonic Cinv characteristics stemming from the energy dependence of 1-D density-of-states and significant Cinv degradation due to quantum capacitance have been found in trigate In0.53Ga0.47As and InAs devices based on the ITRS 2018-2024 technology nodes. This paper indicates that, to compensate the excess inversion-charge (Qinv) loss due to quantum capacitance, the needed mobility gain of the trigate InGaAs and InAs devices (against the Si counterparts) should be at least ∼3× and ∼4×, respectively. This paper also suggests that the quantum-capacitance-induced Qinv loss can be mitigated by raising the fin aspect ratio of the III-V multigate device.
原文 | English |
---|---|
文章編號 | 7349194 |
頁(從 - 到) | 339-344 |
頁數 | 6 |
期刊 | IEEE Transactions on Electron Devices |
卷 | 63 |
發行號 | 1 |
DOIs | |
出版狀態 | Published - 1 1月 2016 |