Impact of Dual-Gate Configuration on the Endurance of Ferroelectric Thin-Film Transistors With Nanosheet Polycrystalline-Silicon Channel Film
- William Cheng Yu Ma*
- , Chun Jung Su
- , Kuo Hsing Kao
- , Ta Chun Cho
- , Jing Qiang Guo
- , Cheng Jun Wu
- , Po Ying Wu
- , Jia Yuan Hung
*此作品的通信作者
研究成果: Article › 同行評審
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引文
斯高帕斯（Scopus）