Imaging of recording marks and their jitters with different writing strategy and terminal resistance of optical output

Cheng Hung Chu; Bau Jung Wu; Tsung-Sheng Kao; Yuan Hsing Fu; Hai Pang Chiang; Din Ping Tsai

doi:10.1109/TMAG.2009.2016156

Imaging of recording marks and their jitters with different writing strategy and terminal resistance of optical output

Cheng Hung Chu, Bau Jung Wu, Tsung-Sheng Kao, Yuan Hsing Fu, Hai Pang Chiang, Din Ping Tsai

光電工程學系

研究成果: Article › 同行評審

6 引文斯高帕斯（Scopus）

摘要

The relation between recording mark formation and jitter value with Radial Orient Spot (ROS) type laser spot recording was investigated by using a new imaging method of conductive-atomic force microscopy (C-AFM). The readout performances of recording marks were studied by changing the terminal resistance of optical pickup head and writing strategies. The results of clear C-AFM images showed that is possible to adjust the conditions of terminal resistance and writing strategies to have better readout signal performance.

原文	English
文章編號	4815988
頁（從 - 到）	2221-2223
頁數	3
期刊	IEEE Transactions on Magnetics
卷	45
發行號	5
DOIs	https://doi.org/10.1109/TMAG.2009.2016156
出版狀態	Published - 5月 2009

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10.1109/TMAG.2009.2016156

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abstract = "The relation between recording mark formation and jitter value with Radial Orient Spot (ROS) type laser spot recording was investigated by using a new imaging method of conductive-atomic force microscopy (C-AFM). The readout performances of recording marks were studied by changing the terminal resistance of optical pickup head and writing strategies. The results of clear C-AFM images showed that is possible to adjust the conditions of terminal resistance and writing strategies to have better readout signal performance.",

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AU - Chu, Cheng Hung

AU - Wu, Bau Jung

AU - Kao, Tsung-Sheng

AU - Fu, Yuan Hsing

AU - Chiang, Hai Pang

AU - Tsai, Din Ping

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AB - The relation between recording mark formation and jitter value with Radial Orient Spot (ROS) type laser spot recording was investigated by using a new imaging method of conductive-atomic force microscopy (C-AFM). The readout performances of recording marks were studied by changing the terminal resistance of optical pickup head and writing strategies. The results of clear C-AFM images showed that is possible to adjust the conditions of terminal resistance and writing strategies to have better readout signal performance.

KW - Conductive-atomic force microscopy (C-AFM)

KW - Jitter

KW - Recording mark

KW - Writing strategy

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Imaging of recording marks and their jitters with different writing strategy and terminal resistance of optical output

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