Highly transparent, high-performance IGZO-TFTs using the selective formation of IGZO source and drain electrodes

Hung Chi Wu, Chao-Hsin Chien

研究成果: Article同行評審

14 引文 斯高帕斯(Scopus)

摘要

In this letter, high-performance, highly transparent amorphous InGaZnO (IGZO) thin-film transistors (TFTs) with IGZO source/drain electrodes were fabricated. Rapid thermal annealing treatment effectively converted IGZO from a semiconductor into a conductor. Using a patterned SiO2 capping layer, highly transparent IGZO-TFTs with selectively formed IGZO electrodes were fabricated on a glass substrate. The mobility of the fabricated IGZO-TFT was 8.3 cm2/V s, ON/OFF ratio was 3.1 × 106, and subthreshold swing was 0.44 V/decade. Thus, the proposed scheme provides a simple and practical method of fabricating high-performance, highly transparent IGZO TFTs.

原文English
文章編號6809183
頁(從 - 到)645-647
頁數3
期刊IEEE Electron Device Letters
35
發行號6
DOIs
出版狀態Published - 1 一月 2014

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