Highly Isotropic Magnetoresistances of High Sheet-Resistance Copper-Particle Films

Juhn-Jong Lin*, Ren Ichi Yamada, Shun Ichi Kobayashi

*此作品的通信作者

研究成果: Article同行評審

9 引文 斯高帕斯(Scopus)

摘要

We have measured the magnetoresistances in ≈ 30-Å-thick Cu-particle films between 1.2 and 4.2 K and in magnetic fields H up to 6 T, with sheet resistances R a (4.2 K) of the films varying from ≈8 kΩ to 2 MΩ. We find that the magnetoresistances are positive, exhibiting broad maxima, at low H, while they change sign and become negative at high H (typically, around 4 T). The magnitudes of the normalized magnetoresistances, ΔR□ (H)/R□ (0)=[R□(H)-Ra (0)]/R□ (0), are of the order of a tenth of a percent or smaller, depending on the values of R□. Particularly, the magnetoresistances are highly isotropic, regardless of the orientation of H being applied parallel or perpendicular to the film plane. These observations are closely connected with the fine-particle structure of our films, and can be qualitatively explained in terms of Zeeman effects in producing magnetoresistances in strongly localized, interacting electrons.

原文English
頁(從 - 到)4514-4520
頁數7
期刊Journal of the Physical Society of Japan
63
發行號12
DOIs
出版狀態Published - 15 十二月 1994

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