High-Voltage and High-Temperature Applications of DTMOS With Reverse Schottky Barrier on Substrate Contacts

Tien-Sheng Chao*, Yao Jen Lee, Tiao Yuan Huang

*此作品的通信作者

研究成果: Article同行評審

2 引文 斯高帕斯(Scopus)

摘要

In this letter, for the first time, application of dynamic threshold voltage MOSFET (DTMOS) with reverse Schottky barrier on substrate contacts (RSBSCs) for high voltage and high temperature is presented. By this RSBSC, DTMOS can be operated at high voltage (>0.7 V), and exhibits excellent performance at high temperature in terms of ideal subthreshold slope, low threshold voltage and high driving current.

原文English
頁(從 - 到)86-88
頁數3
期刊IEEE Electron Device Letters
25
發行號2
DOIs
出版狀態Published - 1 2月 2004

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