@article{e613a92c914242058e0ec1257c59b2f0,
title = "High-quality native-oxide-free ultra-thin oxide grown by in-situ HF-vapour treatment",
abstract = "A high-quality native-oxide-free ultra-thin gate oxide (2.4-3.2nm) realised by a clustered vertical furnace with in-situ HF-vapour treatment is presented. The gate oxide integrity was significantly improved by using the in-situ HF-vapour treatment prior to gate oxidation.",
author = "Chen, {C. L.} and Tien-Sheng Chao and Lai, {C. S.} and Huang, {T. Y.}",
year = "2000",
month = may,
day = "25",
doi = "10.1049/el:20000693",
language = "English",
volume = "36",
pages = "981--983",
journal = "Electronics Letters",
issn = "0013-5194",
publisher = "Institution of Engineering and Technology",
number = "11",
}