High quality Al₂O₃ IPD with NH₃ surface nitridation

Keyphrases

• Al2O3 Oxide 50%
• Aluminum Oxide 100%
• As-deposited Films 50%
• Breakdown Field 50%
• Capacitors 100%
• Charge to Breakdown 50%
• Electrical Properties 50%
• Electrical Reliability 50%
• Electron Traps 50%
• Leakage Current 50%
• Low Dielectric Constant 50%
• N-layer 50%
• Nitridation 100%
• Nitridation Treatment 50%
• Post-annealing 50%
• Post-deposition Annealing 50%
• Property Characteristics 50%
• Reliability Characteristics 50%
• Si-N 50%
• Surface Nitridation 100%
• Trapping Rate 50%

Material Science

• Al2O3 100%
• Aluminum Oxide 20%
• Annealing 20%
• Capacitor 40%
• Film 20%
• Nitriding 100%
• Permittivity 20%
• Surface (Surface Science) 100%