@inproceedings{06e6a646ca7747259ee5e66e85395987,
title = "High performance poly Si junctionless transistors with sub-5nm conformally doped layers by molecular monolayer doping and microwave incorporating CO2 laser annealing for 3D stacked ICs applications",
abstract = "A junctionless (JL) fin thin film transistor (FinTFT) with a novel shell doping profile (SDP) formed by a damage-free conformal molecular monolayer doping (MLD) method and a combination of microwave annealing (MWA) and CO2 laser spike annealing (COLSA) is demonstrated and studied. MWA drives in and partially activates the MLD dopants; the resultant SDP features an ultra-shallow depth (< 5nm) and an abrupt steepness (< 0.8 nm/dec). The dopant activation of the devices experienced MLD and MWA is further enhanced by the nonmelting COLSA without dopant diffusion, and which can also avoid fin deformation and recover surface defects left by fin patterning. Thanks to the enhanced dopant activation by COLSA, the SDP-FinTFTs overall exhibit better performance than the SDP-FinTFTs without COLSA and the conventional implanted (imp) FinTFTs in terms of subthreshold swing (S.S.), on-currents (Ion by 160% compared to the SDP-FinTFTs without COLSA) and on/off current ratio (Ion/Ioff107) for 3D stacked ICs applications. Our results reveal the potential of the proposed SDP formed by MLD, MWA and COLSA enabling a JLFinTFT showing excellent performance.",
author = "Lee, {Yao Jen} and Cho, {Ta Chun} and Sung, {Po Jung} and Kao, {Kuo Hsing} and Hsueh, {Fu Kuo} and Hou, {Fu Ju} and Chen, {Po Cheng} and Chen, {Hsiu Chih} and Wu, {Chien Ting} and Hsu, {Shu Han} and Chen, {Yi Ju} and Huang, {Yao Ming} and Hou, {Yun Fang} and Huang, {Wen Hsien} and Yang, {Chih Chao} and Chen, {Bo Yuan} and Lin, {Kun Lin} and Chen, {Min Cheng} and Shen, {Chang Hong} and Huang, {Guo Wei} and Huang, {Kun Ping} and Current, {Michael I.} and Yi-ming Li and Seiji Samukawa and Wu, {Wen Fa} and Shieh, {Jia Min} and Chao, {Tien Sheng} and Yeh, {Wen Kuan}",
note = "Publisher Copyright: {\textcopyright} 2015 IEEE.; 61st IEEE International Electron Devices Meeting, IEDM 2015 ; Conference date: 07-12-2015 Through 09-12-2015",
year = "2015",
month = feb,
day = "16",
doi = "10.1109/IEDM.2015.7409638",
language = "English",
series = "Technical Digest - International Electron Devices Meeting, IEDM",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "6.2.1--6.2.4",
booktitle = "2015 IEEE International Electron Devices Meeting, IEDM 2015",
address = "美國",
}