High-performance HfO2 gate dielectrics fluorinated by postdeposition CF4 plasma treatment

Woei Cherng Wu*, Chao Sung Lai, Jer Chyi Wang, Jian Hao Chen, Ming Wen Ma, Tien-Sheng Chao

*此作品的通信作者

研究成果: Article同行評審

31 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Chemical Compounds