High nitrogen content InGaAsN/GaAs single quantum well for 1.55 μm applications grown by molecular beam epitaxy

J. S. Wang*, A. R. Kovsh, R. S. Hsiao, L. P. Chen, Jenn-Fang Chen, T. S. Lay, J. Y. Chi

*此作品的通信作者

研究成果: Article同行評審

19 引文 斯高帕斯(Scopus)

指紋

深入研究「High nitrogen content InGaAsN/GaAs single quantum well for 1.55 μm applications grown by molecular beam epitaxy」主題。共同形成了獨特的指紋。

Keyphrases

Engineering