High-aspect-ratio Sub-diffraction-limit Objects Fabricated with Two-photon-absorption Photopolymerization

Ying Ja Chen, Yi Chun Chen, Chan Hwang Lee*, Jyhpyng Wang

*此作品的通信作者

研究成果: Paper同行評審

2 引文 斯高帕斯(Scopus)

摘要

High-aspect-ratio micro-objects were fabricated via multiphoton-absorption photopolymerization using femtosecond lasers. A 100-MHz, 800-nm mode-locked Ti:sapphire laser oscillator was used as the light source. The femtosecond laser pulses were focused by a 0.85 numerical aperture, 60 X objective lens, onto the photoresist. Micro-objects with lateral dimension, 35% the diffraction limit and an aspect ratio close to 4 were produced.

原文English
頁面252-253
頁數2
出版狀態Published - 5月 2002
事件Conference on Lasers and Electro-Optics, CLEO 2002 - Long Beach, United States
持續時間: 19 5月 200222 5月 2002

Conference

ConferenceConference on Lasers and Electro-Optics, CLEO 2002
國家/地區United States
城市Long Beach
期間19/05/0222/05/02

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