High-aspect-ratio Sub-diffraction-limit Objects Fabricated with Two-photon-absorption Photopolymerization

Ying Ja Chen; Yi Chun Chen; Chan Hwang Lee; Jyhpyng Wang

High-aspect-ratio Sub-diffraction-limit Objects Fabricated with Two-photon-absorption Photopolymerization

Ying Ja Chen, Yi Chun Chen, Chan Hwang Lee^*, Jyhpyng Wang

^*此作品的通信作者

影像與生醫光電研究所

研究成果 › 同行評審

2 引文斯高帕斯（Scopus）

摘要

High-aspect-ratio micro-objects were fabricated via multiphoton-absorption photopolymerization using femtosecond lasers. A 100-MHz, 800-nm mode-locked Ti:sapphire laser oscillator was used as the light source. The femtosecond laser pulses were focused by a 0.85 numerical aperture, 60 X objective lens, onto the photoresist. Micro-objects with lateral dimension, 35% the diffraction limit and an aspect ratio close to 4 were produced.

原文	English
頁面	252-253
頁數	2
出版狀態	Published - 5月 2002
事件	Conference on Lasers and Electro-Optics, CLEO 2002 - Long Beach, 美國持續時間: 19 5月 2002 → 22 5月 2002

Conference

Conference	Conference on Lasers and Electro-Optics, CLEO 2002
國家/地區	美國
城市	Long Beach
期間	19/05/02 → 22/05/02

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Link to publication in Scopus

引用此

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title = "High-aspect-ratio Sub-diffraction-limit Objects Fabricated with Two-photon-absorption Photopolymerization",

abstract = "High-aspect-ratio micro-objects were fabricated via multiphoton-absorption photopolymerization using femtosecond lasers. A 100-MHz, 800-nm mode-locked Ti:sapphire laser oscillator was used as the light source. The femtosecond laser pulses were focused by a 0.85 numerical aperture, 60 X objective lens, onto the photoresist. Micro-objects with lateral dimension, 35% the diffraction limit and an aspect ratio close to 4 were produced.",

author = "Chen, {Ying Ja} and Chen, {Yi Chun} and Lee, {Chan Hwang} and Jyhpyng Wang",

year = "2002",

month = may,

language = "English",

pages = "252--253",

note = "Conference on Lasers and Electro-Optics, CLEO 2002 ; Conference date: 19-05-2002 Through 22-05-2002",

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T1 - High-aspect-ratio Sub-diffraction-limit Objects Fabricated with Two-photon-absorption Photopolymerization

AU - Chen, Ying Ja

AU - Chen, Yi Chun

AU - Lee, Chan Hwang

AU - Wang, Jyhpyng

PY - 2002/5

Y1 - 2002/5

N2 - High-aspect-ratio micro-objects were fabricated via multiphoton-absorption photopolymerization using femtosecond lasers. A 100-MHz, 800-nm mode-locked Ti:sapphire laser oscillator was used as the light source. The femtosecond laser pulses were focused by a 0.85 numerical aperture, 60 X objective lens, onto the photoresist. Micro-objects with lateral dimension, 35% the diffraction limit and an aspect ratio close to 4 were produced.

AB - High-aspect-ratio micro-objects were fabricated via multiphoton-absorption photopolymerization using femtosecond lasers. A 100-MHz, 800-nm mode-locked Ti:sapphire laser oscillator was used as the light source. The femtosecond laser pulses were focused by a 0.85 numerical aperture, 60 X objective lens, onto the photoresist. Micro-objects with lateral dimension, 35% the diffraction limit and an aspect ratio close to 4 were produced.

UR - http://www.scopus.com/inward/record.url?scp=85136964182&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:0036459501

SP - 252

EP - 253

T2 - Conference on Lasers and Electro-Optics, CLEO 2002

Y2 - 19 May 2002 through 22 May 2002

ER -

High-aspect-ratio Sub-diffraction-limit Objects Fabricated with Two-photon-absorption Photopolymerization

摘要

Conference

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