Halo and LDD engineering for multiple v_TH high performance analog CMOS devices

Keyphrases

• High Performance 100%
• CMOS Devices 100%
• Halo 100%
• Analog CMOS Circuits 100%
• Engineering Approach 33%
• CMOS Process 33%
• Mixed-signal 33%
• Single chip 33%
• Lightly Doped Drain 33%
• Analog Devices 33%
• DC Gain 33%
• Gate Oxide Thickness 33%
• Drainage Engineering 33%
• Dual Gate Oxide 33%
• Logic-based 33%
• Thickness Scaling 33%
• Drivability 33%
• Gain Matching 33%
• Multiple Threshold Voltages 33%

Engineering

• Engineering 100%
• Gate Oxide 100%
• Oxide Thickness 50%
• Single Chip 50%

Material Science

• Oxide Compound 100%